Skripsi

PENGARUH pH DAN KONSENTRASI HIDRAZIN TERHADAP MATERIAL OKSIDA GRAFENA TEREDUKSI

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Penilaian

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Research has been conducted on the effect of graphene oxide material pH and hydrazine concentration to produce the best reduced graphene oxide material from each variable. rGO is produced through the reduction process of GO material produced from graphite oxidized using hummers method. To determine the quality of the resulting rGO, characterization of XRD, FTIR, SEM-EDS and Raman Spectroscopy is used. In XRD characterization, the best rGO is obtained at pH 3 with an angle of 2θ = 25.763o . In FTIR, the best rGO was obtained at a hydrazine concentration of 80%, which only had an OH functional group at a peak of 3114 cm- 1 and a C=C functional group at 1420 cm-1 . SEM-EDS showed that at rGO pH 3 there was a very large decrease in the amount of oxygen content from 41% in GO to 13.6% in rGO. Based on its morphology from rGO pH 3 there are folded structures on the surface and edges of rGO due to the loss of oxide functional groups. In the raman characterization results, there was an increase in the ID/IG ratio of 0.6972 in GO to 1.8735 in rGO which indicates the success of the reduction process. in addition, the peak shift and increase in 2D intensity indicate that rGO is monolayer. Based on the results of the study, it was found that the best rGO was produced from variations in pH 3 and hydrazine concentrations of 80%

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Availability

Inventory Code	Barcode	Call Number	Location	Status
2407002371	T142862	T1428622024	Central Library (Referensi)	Available but not for loan - Not for Loan

Detail Information

Series Title

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Call Number

T1428622024

Publisher

Indralaya : Prodi Kimia, Fakultas Matematika dan Ilmu Pengetahuan Alam Universitas Sriwijaya., 2024

Collation

xv, 33 hlm.; tab.; ilus.; 20,5 cm

Language

Indonesia

ISBN/ISSN

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Classification

541.370 7

Content Type

Text

Media Type

unmediated

Carrier Type

unspecified

Edition

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Subject(s)

Prodi Ilmu Kimia
Oksida Grafena

Specific Detail Info

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Statement of Responsibility

UIN Dimas

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